Modelling of resolution enhancement processes in lithography
نویسندگان
چکیده
منابع مشابه
Modelling of Resolution Enhancement Processes in Lithography - Microelectronics, 1995. Proceedings., 1995 20th International Conference on
This paper describes the modelling and simulation of two resolution enhancement techniques in lithography ; 1) phase shift mask (PSM) technology and 2) top surface imaging (TSI) with silylation and dry development. The effect of the duty ratio on the image contrast is computed. Simulated one and two dimensional rim shifters and attenuated PSMs are presented. The effect of the aerial image on th...
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ژورنال
عنوان ژورنال: Microelectronics Journal
سال: 1997
ISSN: 0026-2692
DOI: 10.1016/s0026-2692(96)00041-9